| abstract |
[PROBLEMS] To provide a silicon-based dense film and a method for forming the same. A film forming composition comprising a polymer having a silazane bond is coated on a substrate and light having a maximum peak wavelength of 160 to 179 nm is irradiated. Then, the maximum peak wavelength is measured by the maximum peak of the light irradiated before A method for forming a silicon dense film, which comprises irradiating light having a wavelength longer by 10 to 70 nm than a wavelength, and a silicon dense film formed thereby. |