| abstract |
The present invention relates to an etchant composition capable of improving etching properties such as taper angle, seed loss, and visual straightness by making it possible to perform a stable etching process by controlling the undercut of a molybdenum or molybdenum alloy film when etching copper and molybdenum containing films Wherein the etchant composition comprises 10 to 30 wt% of hydrogen peroxide, 0.1 to 5 wt% of an etching inhibitor, 0.1 to 5 wt% of a chelating agent, 0.1 to 5 wt% of an etching additive, 0.01 to 2 wt% of a fluorine compound, 0.01 to 2% by weight of an undercut inhibitor, and 100% by weight of the composition. |