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filingDate 2015-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2015-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20150037796-A
titleOfInvention Photomask blank, photomask and fabrication method thereof
abstract And a phase shifting portion for generating a predetermined phase difference with respect to the exposure light transmitted through the transparent substrate is formed. Wherein the phase shifting portion is a recessed portion that is pierced from a surface of the transparent substrate at an immersion depth for generating a predetermined retardation with respect to exposure light transmitted through a translucent substrate in a portion where the phase shifting portion is not formed, An etching mask film which is dry-etched with a chlorine-based gas and is formed of a material which is not dry-etched with a fluorine-based gas, and which functions as an etching mask at least until reaching the depth of the burying portion when the burying portion is formed by dry etching, Shielding film formed of a material mainly composed of tantalum on the surface of the mask film and capable of being removed by dry etching to form a dent portion of the transparent substrate.
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