http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150035453-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31051 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate | 2014-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150035453-A |
| titleOfInvention | A chemical mechanical polishing composition for polishing silicon wafers and related methods |
| abstract | water; Optionally an abrasive; A cation according to formula (I); A piperazine or piperazine derivative according to formula (II); And a chemical mechanical polishing composition for polishing a silicon wafer having a pH of 9 to 12 containing a quaternary ammonium compound. Methods of making the chemical mechanical polishing composition and methods of using the same are also provided. |
| priorityDate | 2013-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 71.