Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 |
filingDate |
2013-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_134bd9f98bfb5deee9c3e1acccdfc39d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9a01c739742fc2d4ce02c9705ce4d67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0ac96f61e2222852f331ec0ed094e4 |
publicationDate |
2015-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20150028326-A |
titleOfInvention |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device |
abstract |
(1) a step of forming a film by using a sensitizing actinic ray or radiation-sensitive resin composition containing a resin having (P) a repeating unit represented by a specific general formula, (2) a step of forming a film by using an actinic ray or radiation And (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the pattern forming method comprises the steps of: Is 25 mol% or more based on the total repeating units in the resin (P). |
priorityDate |
2012-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |