http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150026779-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-26 |
| filingDate | 2014-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b82192c6ec4bd1e0336a3d612e2de7e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7bf1f69ddc77d59d92eed5213ac499df http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2747b3c571f53c0d98897a7cd43c0be9 |
| publicationDate | 2015-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150026779-A |
| titleOfInvention | Photomask for manufacturing display device, method for manufacturing photomask, pattern transfer method and method for manufacturing display device |
| abstract | Disclosure of the Invention An object of the present invention is to provide a photomask for manufacturing a display device having improved transferability of a fine pattern. There is provided a photomask for manufacturing a display device in which a transfer pattern including a light shielding portion, a phase shifting portion, and a light transmitting portion is formed by patterning a phase shift film, an etching mask film, and a light shielding film, respectively, Wherein the phase shift film is formed by laminating the phase shift film, the etching mask film and the light shielding film in this order, wherein the phase shift film is the phase shift film, or the phase shift film and the etching mask film are stacked in this order Wherein the phase shifting film is made of a material containing chromium and the etching mask film is made of a material having an etching resistance to an etching liquid of the phase shift film, Wherein the phase shifting portion and the light transmitting portion have portions adjacent to each other, Wherein the phase shifting portion and the light transmitting portion have a phase difference of about 180 degrees with respect to a representative wavelength of exposure light of the photomask. |
| priorityDate | 2013-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 35.