http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150019935-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-021 |
| filingDate | 2013-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150019935-A |
| titleOfInvention | Apparatus for generating dual plasma and method of producing polysilicon using same |
| abstract | According to the present invention, there is provided a plasma processing apparatus comprising: a first plasma generating unit and a second plasma generating unit, each of which generates plasma discharge by an alternating voltage; and a third plasma generating unit generating a third plasma by streamer discharge between the first plasma generating unit and the second plasma generating unit And a method of manufacturing a polysilicon using the apparatus for manufacturing polysilicon is provided. The present invention also provides a method of manufacturing a polysilicon using the apparatus, do. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114455587-A |
| priorityDate | 2013-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 30.