http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150018407-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2014-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20150018407-A |
| titleOfInvention | Chemically amplified photosensitive resin composition and method for producing resist pattern using the same |
| abstract | A chemically amplified photosensitive resin composition for a thick film with deterioration of photographic properties over time is suppressed, and a method for producing a resist pattern using the same. The chemical amplification type photosensitive resin composition according to the present invention comprises a compound represented by the following formula (1) and / or a compound represented by the following formula (4) and an acid dissociable, dissolution inhibiting group, Soluble resin, an alkali-soluble resin, a photoacid generator, and an organic solvent, and has a solid concentration of 40 to 65 mass%. Wherein R 1 , R 2 and R 3 are independently a hydrogen atom or an alkyl group, R 4 is a group represented by the following formula (2) or (3), R 5 and R 6 are monovalent hydrocarbons Lt; / RTI > |
| priorityDate | 2013-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 366.