Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8480941479d47c204fa40dcbe910dc5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464eb51a5a437677166a8551512254f3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a7f370388bbd092746549722b253007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcb2c4837169cb5346fc2ab4884a4187 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8630c62dea6ad9b2c3a8e129c90d798 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd0220ce37934efb7eb2a8d8dd8df057 |
publicationDate |
2014-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20140148389-A |
titleOfInvention |
Radiation-sensitive resin composition for liquid immersion exposure and resist pattern forming method |
abstract |
The present invention relates to a radiation-sensitive resin composition for liquid immersion exposure containing [A] a polymer having a structural unit represented by the following formula (1) and a [B] radiation-sensitive acid generator. In the following formula (1), R 1 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R 2 is a single bond, a divalent straight chain hydrocarbon group having 1 to 20 carbon atoms, a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a group obtained by combining one or more of these with -O-. R 3 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R A is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. |
priorityDate |
2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |