Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2203-04103 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
2013-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3cf504410ff77bb35e8d9e615edcbf1b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8bb41ff95f058205a54ba24e7a41115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1131353ef7dea87090989453c19e59b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ec776eb821b6bfec9ccd7821a9f5e97 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_824072a2cd2e301d720dc1bad9835989 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62d5a97793e94267b6c1f64a47255d29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_838b9fab406ae70bc966076b6616679f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3697183931f5b8ccd94576976ab797e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d1667385bf3f8acb6be594712ceaac8 |
publicationDate |
2014-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20140148379-A |
titleOfInvention |
Photosensitive resin composition, method for manufacturing processed glass substrate using same, and touch panel and method for manufacturing same |
abstract |
Disclosed is a photosensitive resin composition used for forming a resistor as a mask when etching a glass substrate with hydrofluoric acid. Wherein the photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound, (C) a photopolymerization initiator and (D) a silane compound, wherein the photopolymerizable compound (B) And compounds having cyanomic rings. |
priorityDate |
2012-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |