| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ccb2f721f6d2a7f79ce09d39998cea87 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4854
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-4825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-7671
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L75-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L75-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0076f6f3cc603e05c49f8829613e2a02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5e15632c923a2cf6b80f249109ccbf8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1dd5bfec095005de43b0fb19e86fa4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f04694f5169da8e8e743b00bacf13c17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cecccb74c24d4d8909588e94b3b613d8 |
| publicationDate |
2014-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140147859-A |
| titleOfInvention |
Polishing pad and method for producing polishing pad |
| abstract |
A step of dissolving a composition for forming a polyurethane resin film containing a polyurethane resin and an additive in a soluble solvent of the resin so that an insoluble component in the solution is less than 1% by mass based on the total mass of the composition for forming a polyurethane resin film; A method for producing a polyurethane resin, comprising the steps of: removing an insoluble component; adding a poor solvent to 1 g of the solid mass of the resin to the solution from which the insoluble component has been removed; And a step of forming the polyurethane resin film on the film base material by the wet coagulation method to form a polyurethane resin film on the film base material, By the method of manufacturing a polishing pad having a polishing layer, it is possible to perform polishing with less polishing scratches and to form a stable film It provides a manufacturing method and a polishing pad of a polishing pad for a bunch. |
| priorityDate |
2012-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |