| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3209
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-201
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-43 |
| filingDate |
2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a044fa871cee41cee92012094b96dd00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d664a2a31377ce69eb486c99d12a8ba4 |
| publicationDate |
2014-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140141482-A |
| titleOfInvention |
Cleaning composition of substrate |
| abstract |
An object of the present invention is to provide a cleaning composition for a substrate used for cleaning a substrate surface having a water contact angle of 100 degrees or more contaminated by a silicone component. The detergent composition of the substrate is a detergent composition used for cleaning the surface of a substrate, (A) Quaternary ammonium salt: 0.1 to 2.0 mass% (B) Water: 0.1 to 4.0 mass% (C) Organic solvent: 94.0 to 99.8 mass% And the like. |
| priorityDate |
2013-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |