| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d21cbff64022f95c237c0bd3ec8656ca |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-809
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31931
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-788
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-152
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-839
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-89
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S977-891
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31504 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C43-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D153-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B38-10 |
| filingDate |
2013-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d04611b31e95c2b267edcf61cfd3a59d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13df937234e701694cd52c19c3a26a91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68380cd8ca93d89eaab15e7c88fd6b0c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b511201f28ad4a6354e8a09b2a2f3000
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2fdbcb12b79dccbee7726e44bde939f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d636325659942b8d97bf29eaa8deefb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ad36f51cc32cb1410da8f100dbe8d16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_365413aa30465206a1db4e39e51984c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05d732e682c19a150b984ba6f19ff2ae |
| publicationDate |
2014-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140136933-A |
| titleOfInvention |
Using chemical vapor deposited films to control domain orientation in block copolymer thin films |
| abstract |
The present invention uses a vacuum deposited thin film of material that creates an interface that preferentially interacts with different domains of the lower block copolymer film. The non-preferential interface prevents the formation of a wetting layer and affects the orientation of the domains in the block copolymer. The purpose of the deposition polymer is to produce nanostructured features of the block copolymer film that can act as a lithographic pattern. |
| priorityDate |
2012-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |