http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140131313-A

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filingDate 2014-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_474c932f8beca75a8562f0bb1ff6ab4f
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publicationDate 2014-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140131313-A
titleOfInvention Method of manufacturing semiconductor device, substrate processing apparatus, and recoding medium
abstract A problem to be solved is to suppress the decrease of the film formation rate and to suppress the increase of the dielectric constant when forming a thin film containing a predetermined element, oxygen, carbon and nitrogen in a low temperature region. A step of supplying a carbon-containing gas to a substrate, a step of supplying a gas containing a predetermined element to the substrate, a step of supplying a carbon-containing gas to the substrate, A thin film containing a predetermined element, oxygen, carbon, and nitrogen is formed on a substrate by performing a cycle of performing a process of supplying an oxidizing gas to the substrate and a process of supplying a nitride gas to the substrate in this order a predetermined number of times Process.
priorityDate 2012-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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