Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
The present invention relates to a polymer comprising a repeating unit represented by the following formula (A), a repeating unit represented by the following formula (B), a repeating unit represented by the following formula (C) (P) having at least two repeating units represented by the following general formula (E) and repeating units represented by the following general formula (E).