| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d794b4904270a2f081a93438a2d2d076 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2208-00681
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0894
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0883
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0869
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0879
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0871 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B1-00 |
| filingDate |
2013-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_236eabc7644c593a244f790a8c65b21a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23122c2152ded544d5861980d3bd35eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10a7042dbf9261d9149b0f77ffa24f53 |
| publicationDate |
2014-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140120691-A |
| titleOfInvention |
Device for nano particle generation by using icp |
| abstract |
The present invention maximizes the effect of preventing agglomeration of silicon nanoparticles (A) produced by an ICP (Inductively Coupled Plasma) plasma reaction, thereby improving the particle size control performance of the silicon nanoparticles (A) (A) DML productivity by improving the discharge performance of the mesh filter (51) for collecting the silicon nanoparticles (A) and configuring the mesh filter (51) to be replaceable during operation of the apparatus. And to provide a silicon nanocrystal production apparatus capable of reducing the number of silicon nanocrystals. To this end, the present invention is characterized in that the injected gas is produced as silicon nano-particles (A) by a plasma reaction of an ICP (Inductively Coupled Plasma) coil 21, And a corona discharging unit 300 for charging the silicon nanocrystals to the silicon nanocrystals. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160066599-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023136607-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023136606-A1 |
| priorityDate |
2013-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |