| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2014-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6362403cb21e64bba8369d02fcb0318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_505218b0894cc57fcc679b7e6d3bfd96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e04511b6ef753a717725f9debdfc548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b3df795b995f217253365f1a058ba26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8296c8df2f19788723d0b5618e02c04d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_022dd828ba016d1a6cf5f126c039007a |
| publicationDate |
2014-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140116809-A |
| titleOfInvention |
Resist composition and method of forming resist pattern |
| abstract |
(PROBLEMS) To provide a resist composition capable of forming a resist pattern with reduced roughness while maintaining good sensitivity. (A) a polymeric compound having a structural unit (a0) represented by the general formula (a0-1), an acid generator component (B) for generating an acid upon exposure, and an acid generator component (D1), and the mixing ratio of the component (B) and the component (D1) is 0.5 or more in a molar ratio represented by (D1) / (B). In the formula (a0-1), R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms or a halogenated alkyl group having 1 to 5 carbon atoms. Ya 01 is a single bond or a divalent linking group. X 01 is a sulfur atom or an oxygen atom. Ra 01 is a cyclic group, a chain-like alkyl group or a chain-like alkenyl group which may have a substituent. [Chemical Formula 1] |
| priorityDate |
2013-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |