| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2014-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e04511b6ef753a717725f9debdfc548
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6362403cb21e64bba8369d02fcb0318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_695f5d1529a84814bb77f017051187c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da147af6c5d2234835ca331337f8a8c |
| publicationDate |
2014-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140116808-A |
| titleOfInvention |
Resist composition and method of forming resist pattern |
| abstract |
(PROBLEMS) To provide a resist composition capable of forming a resist pattern with reduced roughness while maintaining good sensitivity. The resist composition contains a polymer compound having a partial structure represented by the general formula (a0-r-1) and a structural unit represented by the general formula (a0-1). In the formula (a0-r-1), Y 1 is a divalent linking group. R 2 and R 3 are each a group of 0 to 20 carbon atoms other than a fluorine atom, and either one of R 2 and R 3 may form a ring with Y 1 . m is an integer of 1 or more, and M m + is an organic cation of m. In the formula (a0-1), R is a hydrogen atom, an alkyl group or a halogenated alkyl group. Ya 01 is a single bond or a divalent linking group. X 01 is a sulfur atom or an oxygen atom. Ra 01 is a cyclic group, a chain-like alkyl group or a chain-like alkenyl group which may have a substituent. [Chemical Formula 1] |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210109454-A |
| priorityDate |
2013-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |