| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f752e78cb0d4e529b272d2fdf2c1f323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_672f02ea3604879642aedb392ee74533
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1436eeb7a3b020dc564e5e4e42536a74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5472f15aeda45041f827fcec236b912f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24d8f1ebaeee530e4330bb68ab90f815
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab68894cc8046bd8f9d6ca672de9655b |
| publicationDate |
2014-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140101156-A |
| titleOfInvention |
Thinner compositoin and uses thereof |
| abstract |
The present invention relates to a thinner composition and its use. The thinner composition according to the present invention has excellent dissolving power and appropriate volatility for various kinds of photoresists and can effectively remove unnecessary photoresist in an edge bead removal process and the like in a short time, And the like, so that it is possible to form an effective photosensitive film even with a small amount of photoresist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160074396-A |
| priorityDate |
2013-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |