| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_099413ae0cf5a2b6398b5151766cd260 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-41733
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78618
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7869 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
| filingDate |
2013-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf751067a895b621a2f00a3375e2bf03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6d3f1a06817c82fd2ead7a528d9df31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9a2bbbb1d7a32c2250ee8d11ffe5a10 |
| publicationDate |
2014-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140099094-A |
| titleOfInvention |
Manufacturing method of thin film transistor |
| abstract |
A method of manufacturing a semiconductor device, comprising: forming an oxide semiconductor on a substrate; forming an insulating film on the oxide semiconductor; forming an opening through the insulating film to expose an upper surface of the oxide semiconductor; A method of manufacturing a thin film transistor including the steps of: |
| priorityDate |
2013-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |