Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2203-04103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-0443 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-04164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-0446 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F3-041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
filingDate |
2012-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12cee763db29fa152edc93ce28ca8c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1131353ef7dea87090989453c19e59b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_924cf08d8b277a06afd8da9dc19edbf1 |
publicationDate |
2014-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20140097356-A |
titleOfInvention |
Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured film |
abstract |
A method of forming a resin cured film pattern of the present invention is a method of forming a resin cured film pattern comprising a first step of providing a photosensitive layer comprising a photosensitive polymer composition containing a binder polymer, a photopolymerizable compound, a photopolymerization initiator and a thiol compound on a substrate, And a third step of removing a predetermined portion of the photosensitive layer to form a cured film pattern of a predetermined portion of the photosensitive layer, Wherein the resin composition comprises an oxime ester compound and / or a phosphine oxide compound as the photopolymerization initiator. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102014225569-A1 |
priorityDate |
2011-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |