| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2012-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58c55c8a433fde54e93d7037d48817a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4d50b2e24743d4b503e00f814917c63
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_067d64e1f45388810c68a0e6f576fe48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40dcf6ff094e42baf16e0eec03443e75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_326bf765e6e909e18c8655c29359618a |
| publicationDate |
2014-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140097133-A |
| titleOfInvention |
Hybrid photoresist composition and pattern forming method using thereof |
| abstract |
The present invention relates to a hybrid photoresist for improved resolution and a method of pattern formation using the photoresist composition. The photoresist composition includes a radiation sensitive acid generator, a crosslinking agent, and a polymer having a hydrophobic monomer unit having a hydroxy group and a hydrophilic monomer unit. At least some of the hydroxyl groups are protected by an acid labile moiety having a low activation energy. The photoresist can cause a hybrid reaction to a single exposure. In the patterning formation method, the hybrid reaction is used to form a patterned structure in the photoresist layer. The photoresist composition and patterning method of the present invention are useful for printing small features with precise image control, and are particularly useful for printing spaces of small dimensions. |
| priorityDate |
2011-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |