Pattern forming method, multi-layered resist pattern, multi-layered film for organic solvent development, manufacturing method of electronic device, and electronic device
The pattern forming method includes the steps of (i) forming an antireflection film on the substrate using the first resin composition (I), (ii) forming a resist film on the antireflection film using the second resin composition (II) (Iii) exposing the multilayer film having the antireflection film and the resist film, and (iv) developing the antireflection film and the resist film in the exposed multilayer film using an organic solvent-containing developer And forming a negative pattern.