abstract |
More particularly, the present invention relates to a photosensitive resin composition and an insulating film made therefrom, and more particularly, to a photosensitive resin composition containing a thermal base generator represented by Chemical Formula 1 or Chemical Formula 2, To a photosensitive resin composition capable of maintaining a high sensitivity and maintaining a high transmittance even after a post-process, and an insulating film made therefrom. |