http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140086589-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 2012-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63912a5c1759f6a9ec11682fcae8b1bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cfc1dfe607a6e5287236529983c4b78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4496bf2e1a8e2af243a92a3843cfcfc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14599ad4e04c2b22d5ef30b57aa7a852 |
publicationDate | 2014-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-20140086589-A |
titleOfInvention | Methods of patterning block copolymer layers and patterned polymer structure |
abstract | A method for patterning a block copolymer layer is provided. The method for patterning a block copolymer layer comprises the steps of: providing a substrate having a topographic pattern; forming a block copolymer layer on a surface of the substrate; and performing heat treatment on the block copolymer layer and directing an assembly of the block copolymer according to the pattern. The block copolymer is separated into anisotropic individual regions by the heat treatment, and the anisotropic individual regions are oriented in a direction perpendicular to the substrate. A layer thickness (H) of the block copolymer satisfies the following condition: 1.08L_0<H<1.65L_O or 2.16L_0<H<2.39L_0. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190109016-A |
priorityDate | 2012-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 82.