Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
filingDate |
2013-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1d2acb0f61cd5893082ebef7a2dc0ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a4b82f3811cc59f804f728979e50b55c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_908332fb527bec06ccdc988fa756447e |
publicationDate |
2014-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20140083880-A |
titleOfInvention |
Photosensitive resin composition |
abstract |
A method of forming a pattern comprising a photosensitive resin composition capable of forming a pattern having excellent storage stability and excellent in precision at a low exposure dose and a polysiloxane film using the photosensitive resin composition and a method of forming a polysiloxane film formed using the photosensitive resin composition And a pattern formed by the pattern. (A) a photosensitive resin composition comprising at least one member selected from the group consisting of a hydrolyzable silane compound, a hydrolyzate of a hydrolyzable silane compound, and condensates thereof, and (B) a photoacid generator or photoacid generator (C) a compound which generates an imidazole compound of a specific structure by light is added. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20230009192-A |
priorityDate |
2012-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |