| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2013-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_695f5d1529a84814bb77f017051187c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fb03c6048dc0bedca91ce5ae3ecb7e8 |
| publicationDate |
2014-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140074240-A |
| titleOfInvention |
Resist composition, and method for producing resist pattern |
| abstract |
A resist composition capable of improving sensitivity and lithography characteristics by using a novel photoreaction type quencher and a method of forming a resist pattern using the resist composition. (A) and a photoreactive quencher (D0) in which the solubility in a developing solution is changed by the action of an acid and the solubility in a developing solution is changed by the action of an acid, , And the photoreactive quencher (D0) contains a compound (D0-1) represented by the following general formula (d0). Wherein R 1 and R 2 represent an alkyl group having 1 to 10 carbon atoms which may have a substituent, R 3 and R 4 represent an alkyl group having 2 to 10 carbon atoms which may have a substituent, and R 3 and R 4 represent an alkyl group having 1 to 10 carbon atoms, And may form a ring with the sulfur atom. X - is a counter anion.] |
| priorityDate |
2012-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |