| abstract |
An alumina sintered body having a purity of 99.99% or more, a relative density of 98% or more, and an average crystal grain size of less than 5 占 퐉 or a purity of 99.999% or more and a relative density of 98% Sputtering target using alumina sintered body. By using this sputtering target, a sputter film having excellent insulation resistance and homogeneity can be obtained. |