| abstract |
In the patterning by the double exposure using the liquid immersion lithography process, the pattern formed on the first layer is deactivated so that the pattern of the first layer is exposed to light and becomes alkali-soluble when exposed during the pattern formation of the second layer A pattern forming method capable of forming a second layer pattern while maintaining the first layer pattern, and the like. The pattern forming method includes a step of forming a first pattern on a substrate, a step of deactivating the first pattern, and a step of forming a pattern using a composition for forming a second resist layer by using a composition for forming a first resist layer A step of forming a second resist layer on the formed substrate and exposing the resist layer to light; and a step of forming a second pattern on the space portion of the first pattern by developing the composition, wherein the composition for forming the first resist layer is a crosslinking agent . ≪ / RTI > |