| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_94b59679f6977a0882adb7bde9b9871c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-361 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-60 |
| filingDate |
2012-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_968b91d3e2af88882e7e5c37f8f9ce15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9286500ebde32fd2cd6ec811659767f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b39e0d22ff9ac2bfb0ac9d2779a45967 |
| publicationDate |
2014-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140066725-A |
| titleOfInvention |
Composition for cleaning substrate after chemical mechanical polishing |
| abstract |
A semiconductor processing composition and method for semiconductor wafer cleaning after chemical mechanical polishing, comprising a phosphorus base and optionally at least one surfactant. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210154886-A |
| priorityDate |
2011-08-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |