| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65e6cc42bb2719da1d60772d005416f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3164a963ca21cec1151213cb1bb95e77 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-80
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2004-64 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2012-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4dd3bc541a18f10f5674cd2e46037d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01553271876b95a0816e21cb4483f352
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18c294d3319dca50d39c4279a8a0f3fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f115bd9dd7ab973f4d709656598180b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d3a35797efc29d51d5f1f9586ca97fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eee8866df62f1fbc836946cb33849fa |
| publicationDate |
2014-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140059346-A |
| titleOfInvention |
Slurry and additive composition for environmentally friendly STI process |
| abstract |
The present invention relates to slurries and additive compositions for environmentally friendly STI processes wherein slurry compositions comprising abrasive particles prepared using the liquid phase process of the present invention have excellent universal selectivity properties , A high polishing rate and a cleaning performance, and it can exhibit excellent polishing characteristics including a hydrogen bond between the hydrogen of the carboxyl group of the anionic polymer containing a carboxyl group and the oxygen of the polyoxyethylene oxide (PEO) When the polishing process is carried out using a polishing additive, it is possible to realize a common selection ratio by applying the complexity of the complexation between the anionic polymer and the non-ionic polymer, and it is possible to control the selection ratio of the nitride film and the selectivity ratio of the poly have. It can be applied not only to the poly-film stopping process but also to the nitride film stop process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190072234-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020130251-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112479389-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160080555-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113242891-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113242891-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019124740-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019124741-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110272685-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11384255-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200077732-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114958207-A |
| priorityDate |
2012-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |