http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140054010-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cc2c72caaa56303e5ab9f48ebe6b089b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_039c94d378d5add62dd23beb6866420a
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3886
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-761
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-762
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5445
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3839
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3847
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3429
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6261
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-58014
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-5611
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-5626
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-5607
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-851
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-851
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
filingDate 2012-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_655ce70d533b925fa5e8d39ee2c4b228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe64df71c8d87eecdf67970e6f7f4f08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9ec55d2752072b07e70bcc00b672032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b2ef63b426f1d0655ca66b8e609a285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e5d759de3254b013fe51fa9a8cba58c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4b45902907997bf274e45b5926eb9a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cffd8f259e3f5df42f69b846a89e0ed6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b8397516b43ede2ed41c46b6e57c0c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af7a915d1dade8a5dab9a7616e722bd6
publicationDate 2014-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140054010-A
titleOfInvention MgO target for sputtering
abstract The present invention provides a MgO target for sputtering capable of accelerating a deposition rate even when MgO is used as a target for sputtering when a MgO film is formed. The target for sputtering according to the present invention is a sputtering MgO target containing MgO and a conductive material as a main component. When the MgO film containing the conductive material is formed by the DC sputtering method, orientation of the MgO film is imparted to the deposited MgO film The MgO target for sputtering is a MgO target for sputtering.
priorityDate 2011-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915

Total number of triples: 47.