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publicationDate 2014-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140050936-A
titleOfInvention Photomask and manufacturing method thereof
abstract The present invention provides a photomask and a method of manufacturing the same. In this photomask, the light shielding pattern is not damaged in the cleaning process using ammonia water by the etching stopper film covering the side wall of the light shielding pattern, so that the change in CD of the light shielding pattern can be minimized.
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