Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_242f9943073f72a7e5ebaf173662f5b9 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-549 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B6-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B3-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J3-00 |
filingDate |
2011-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a168223f816697716af6f87ba09d9448 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38134f9e45fc2f8203b0f19843fbb4b3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f98f5b42f6290b6b0788c370274cd14b |
publicationDate |
2014-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20140048978-A |
titleOfInvention |
Method for polymerization of silanes and cyclosilanes using N-heterocyclic carbines, metal complexes with N-heterocyclic carbin ligands, and lanthanide compounds |
abstract |
In order to prepare high molecular weight, low volatility, high purity, solid solubility and / or high viscosity soluble polysilane, polygerman and / or polysilager only with low levels of carbon and metal impurities, the general formula Si n H 2n And methods and compositions for polymerizing and / or oligomerizing silane (and optionally cyclosilane) compounds comprising halosilanes and arylsilanes as well as silanes of Si n H 2n +2 under certain control. The polysilanes, polygermans and / or polysilagermans are useful as precursors for forming conductive films, semiconductor films and insulating films containing silicon and / or germanium. |
priorityDate |
2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |