http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140048062-A

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filingDate 2013-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b928784508e6e553db8c6b1cc064ffa1
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publicationDate 2014-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140048062-A
titleOfInvention Photomask for improving resolving power and productivity of a flat panel display device and method for manufacturing the same
abstract A photomask capable of overcoming the marginal resolution of an exposure apparatus for a flat panel display using a composite wavelength and capable of improving productivity and a method of manufacturing the same are disclosed. A photomask according to an embodiment of the present invention includes a transparent portion; A semi-transmissive film pattern formed on the phase-inverted low-light-transmitting film pattern and the phase-inverted low-light-transmitting film pattern and having a relatively higher etch rate than the phase-inverted low-light-transmitting film pattern, Shielding portion; And a phase inverted low light-transmissive portion interposed between the transparent portion and the light-shielding portion.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9733569-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017182052-A
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