| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_758994071efb42b565fc2c04637be131 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13398 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-1339
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-13394
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-075 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
2012-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52741d82c50c8a71afbfc1f9c5758640
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0637aef106f4f68b697b39c5590d0db0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0a5753c265ae4fa921d16c1b4c8e765 |
| publicationDate |
2014-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140043431-A |
| titleOfInvention |
Photosensitive resin composition, hardened | cured material, and spacer |
| abstract |
An object of the present invention is to provide a photosensitive resin composition capable of forming an elastic spacer while achieving both elastic recovery properties and adhesion, and the photosensitive resin composition of the present invention comprises a hydrophilic resin (A) and a polyfunctional (meth) acrylate. (B), a radical trapping agent (C), a photoinitiator (D), and a metal element containing compound (E) as essential components, and the energy difference of the lowest co-orbit of (C) and the highest point orbit of (D) is 11.5 eV It is an alkali developable photosensitive resin composition characterized by the following. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200020006-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170110276-A |
| priorityDate |
2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |