| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_319905d527776c37a99d1a4cc621e425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3d903d169bbe9813f245249144da874
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c106947dc2643c6d5c41201c395761a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aec00597203d63642baa58ab43ec580e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ca8383425b1fe77487ce198d4da2f74 |
| publicationDate |
2014-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140032695-A |
| titleOfInvention |
Photoresist composition and patterning method using the same |
| abstract |
The present invention relates to a photoresist composition and patterning method using the same. The photoresist composition of the present invention minimizes the loss from side etching to form a micro pattern having a great linearity and a uniform shape. The photoresist pattern is able to improve the adhesion properties to a bottom substrate, the sensitivity, the heat-resisting properties, etc. [Reference numerals] (AA) Example 1; (BB) Example 2; (CC) Comparative example 1 |
| priorityDate |
2012-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |