http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140023843-A

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filingDate 2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63a8f11a981fbe0d38823393c62c42f7
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publicationDate 2014-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140023843-A
titleOfInvention Formation method of fine pattern using photocurable polymer resin composite
abstract The present invention relates to a photocurable polymer resin composite, and more specifically, to a nano-implint polymer resin composite, an inorganic additive is mixed with an acrylate-based polymer resin having an acrylic group to form a nano-pattern The present invention relates to a polymer resin composite for nanoimprint and a method of forming a nanoimprint fine pattern using the same, which enhance the mechanical strength of and improve the precision of the micropattern by adjusting the shrinkage rate during photocuring.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101682556-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101593457-B1
priorityDate 2012-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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