Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a6928a4722175b6afaf60db3754437c7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 |
filingDate |
2012-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63a8f11a981fbe0d38823393c62c42f7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06cefc54a3fbd7a048c95e7311eb1b44 |
publicationDate |
2014-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-20140023843-A |
titleOfInvention |
Formation method of fine pattern using photocurable polymer resin composite |
abstract |
The present invention relates to a photocurable polymer resin composite, and more specifically, to a nano-implint polymer resin composite, an inorganic additive is mixed with an acrylate-based polymer resin having an acrylic group to form a nano-pattern The present invention relates to a polymer resin composite for nanoimprint and a method of forming a nanoimprint fine pattern using the same, which enhance the mechanical strength of and improve the precision of the micropattern by adjusting the shrinkage rate during photocuring. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101682556-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101593457-B1 |
priorityDate |
2012-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |