| abstract |
PROBLEM To provide the composition for pattern reversal film formation containing the silicon atom which can be reworked with the organic solvent normally used for peeling a resist pattern. [Solution] A composition for forming a pattern reversal film including polysiloxane, an additive, and an organic solvent, wherein the polysiloxane has a structural unit represented by the following formula (1) and a structural unit represented by formula (2), (In formula (1), R 1 represents an alkyl group having 1 to 8 carbon atoms.) (In formula (2), R 2 represents an acryloyloxy group or a methacryloyloxy group, n is 2-4. The additive is an organic acid having at least two carboxyl groups and / or hydroxy groups, and a method of forming a pattern reversal film and an inversion pattern using the composition. |