http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140012111-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-4223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L67-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-1455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2012-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08af8e1a8afe96faf8248c1803248121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0207ac1bc5b6dff996919c7180c91bf6 |
| publicationDate | 2014-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20140012111-A |
| titleOfInvention | A resist underlayer film forming composition and a method of forming a resist pattern using the same |
| abstract | [Problem] The present invention provides a resist underlayer film forming composition for lithography that can form a uniform resist underlayer film without defect even when a thin film having a film thickness of 20 nm or less is formed. [Resolution] A resist underlayer film-forming composition for lithography comprising a polymer having a structure represented by the following formula (1) at the end of a polymer chain, a crosslinking agent, a compound for promoting crosslinking reaction, and an organic solvent. (In formula, R < 1> , R < 2> and R < 3> respectively independently represents a hydrogen atom, a C1-C13 linear or branched hydrocarbon group, or a hydroxyl group, and in said R < 1> , R < 2> and R < 3> At least one is the hydrocarbon group, m and n each independently represent 0 or 1, and the main chain of the polymer is bonded to a methylene group when n represents 1, and when -n represents 0, -O- To the group represented). |
| priorityDate | 2011-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 124.