http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20140001903-U

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filingDate 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-20140001903-U
titleOfInvention Thinning device of resist layer
abstract (assignment) In the thin film thinning apparatus of the resist layer formed with the thin film processing unit which micellizes the component in a resist layer with the thin film processing liquid in a dip tank, and the micelle removal processing unit which removes micelle with a micelle removal liquid, It is to provide a thin film thinning apparatus of a resist layer which can suppress the carry-out of the thin film processing liquid from a dip tank, while suppressing backflow and the flow of the thin film processing liquid on the surface of the resist layer. (Solution) Thin-filming apparatus provided with the micelle removal liquid blocking cover in the conveyance roll pair of the boundary part of a thin-film-processing unit and a micelle removal processing unit, The thin-filming apparatus provided with the liquid removal roll pair between the outlet roll pair of a dip tank, and the inlet roll pair of a micelle removal processing unit, and A problem can be solved by the thin film formation apparatus of the resist layer in which the liquid barrier is provided between the outlet roll pair of a dip tank and the inlet roll pair of a micelle removal processing unit.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160001020-U
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180002477-U
priorityDate 2012-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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