| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C233-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2013-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b61cfadd74185e9e1eb267fdac7e21e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e82653ba4444ac57375740ceeb8f682
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a103399105aed76cca56947ee42834dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_802d961e267cab2ff5c3f5972b78b315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc9a29ba90b9f3443d76acddd56968c0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5778d74bdb48cd3668e715e1786b0a14 |
| publicationDate |
2014-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140000657-A |
| titleOfInvention |
Photoresist Including Amide Component |
| abstract |
A novel photoresist composition is provided comprising a component comprising an amide group and a plurality of hydroxyl groups. Preferred photoresists of the present invention are resins having a mine-labile group; Photoacid generator compounds; And an amide component having a plurality of hydroxyl groups that can function to reduce the diffusion of undesirable photogenerated-acids from the non-exposed areas of the photoresist coating layer. |
| priorityDate |
2012-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |