| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-716
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
| filingDate |
2011-09-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad6f2018726d7b9d9323115f7bc3ecc3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d784f46c5f35aad97341009ba5dad33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f73a270ddcc3792b1bff4740b69cbe1f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8a7f370388bbd092746549722b253007 |
| publicationDate |
2014-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20140000203-A |
| titleOfInvention |
Radiation-sensitive resin compositions, polymers and compounds |
| abstract |
This invention is a radiation sensitive resin composition containing the polymer which has a structural unit represented by [A] following General formula (I). In the said general formula (I), R < 1> is a hydrogen atom or a methyl group. X is a bivalent alicyclic hydrocarbon group which may have a substituent. Y is a C1-C20 bivalent hydrocarbon group. R 2 is a methyl group or a trifluoromethyl group. Y in the following general formula (I) is preferably an alkanediyl group having 2 to 4 carbon atoms. It is preferable to further contain a radiation sensitive acid generator (B). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20160124769-A |
| priorityDate |
2010-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |