| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1d29f7ac2c7f9be9f7dae1a83bbb5c92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-124 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-20 |
| filingDate |
2011-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3d977aefb507dae169e215236c06c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b450a532f82dc2d5827dde5cdd41ae36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25328e8155f7442221c1aaf9f90d7942 |
| publicationDate |
2013-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130140638-A |
| titleOfInvention |
Duplicating mold for nanoimprint having a composition for photocurable nanoimprint, a method of forming a pattern using the composition and a cured product of the composition |
| abstract |
Provided is a photocurable composition for nanoimprint excellent in productivity with a composition having excellent etching resistance and good dispersibility. Furthermore, even when the metal mold | die is pressed by comparatively low pressure, the composition for photocurable nanoimprint which can facilitate the transcription | transfer of a pattern is provided. The composition for photocurable nanoimprint is a mixture of (A) an organosilicon compound and a (meth) acryl group-containing silicon compound with water in an amount of at least 0.1-fold and less than 1.0-fold mole relative to the number of moles of all alkoxy groups in the mixture. It comprises the partially hydrolyzed product which decomposed | disassembled, the (B) polymerizable monomer which has a (meth) acryl group, and (C) photoinitiator. Moreover, (A) may also contain the partial hydrolyzate of a fluorinated silane compound and / or a metal alkoxide. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10744684-B2 |
| priorityDate |
2010-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |