| abstract |
(A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; And (B) an aqueous polishing composition comprising one or more abrasive particles, The use of compound (A) for the manufacture of electrical, mechanical and optical devices and a method of polishing a substrate material for electrical, mechanical and optical devices using the aqueous polishing composition. |