http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130130455-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd3cc3c169eb80c23d5d53984fe68da |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-087 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-021 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-021 |
| filingDate | 2012-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11bd8627007ed4c3dce100999a5a3eb1 |
| publicationDate | 2013-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130130455-A |
| titleOfInvention | Flexible Silicon Wire Manufacturing Equipment |
| abstract | The flexible silicon wire manufacturing apparatus of the present invention comprises a reaction chamber for coating a silicon thin film on a base wire, an induction coil antenna wound on the reaction chamber to supply energy for generating inductively coupled plasma into the reaction chamber, An impedance matcher connected between the induction coil antenna and the first power supply source, a gas supply source for supplying a reaction gas for silicon coating to the reaction chamber, and a second power supply source for supplying radio frequency power to the reaction chamber, And an exhaust pump connected to the exhaust pipe and exhausting the gas. In the flexible silicon wire manufacturing apparatus of the present invention, the base wire continuously runs inside the reaction chamber, and self-heating or induction heating is performed, and the silicon thin film is coated by the plasma reaction. Thus, high-speed production is possible, and while the base wire is heated by self-heating or induction heating at a high speed, a high-quality silicon thin film coating is achieved. |
| priorityDate | 2012-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 19.