| abstract |
The present invention relates to a liquid phase process for producing an indium oxide-containing layer in the order of a) to d), an indium oxide-containing layer preparable from the method and its use: a) applying to the substrate a coating composition preparable from a mixture comprising at least one indium oxide precursor and at least one solvent and / or dispersion medium; b) irradiating the composition applied to the substrate with electromagnetic radiation; c) optionally drying; And d) thermal conversion to an indium oxide-containing layer. Wherein the indium oxide precursor is an indium halogen alkoxide of the formula InX (OR) 2 , wherein R is an alkyl radical and / or an alkoxyalkyl radical, X is F, Cl, Br or I, and the irradiation is radiation Significant fractions of are carried out with electromagnetic radiation in the range of 170 to 210 nm and 250 to 258 nm. |