http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130124225-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F21S6-002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F21Y2115-20 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A63F13-327 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-004 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05B33-10 |
| filingDate | 2013-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83a635e97e26d5017dc4c4b8a17c1dc9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_078337a9813170040094c90aa73f3ede http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41b9dc2caafaaf25d44589bb1804ed5d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4af9e276c83d36977454a8c2161912da http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_622632c39e84250e22bfd819c373993f |
| publicationDate | 2013-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-20130124225-A |
| titleOfInvention | Manufacturing method and film forming apparatus of light emitting device |
| abstract | Provided is a highly reliable organic EL device. Provided is a film forming apparatus that can produce highly reliable organic EL devices. The first step of heating and vaporizing the film forming material in the film forming chamber under reduced pressure and the second step of forming a layer included in the EL layer in the film forming chamber were measured by using an exhaust and mass spectrometer to measure the partial pressure of water in the film forming chamber. The partial pressure of water at the start of a 2nd process is a value smaller than the average value of the partial pressure of water in a 1st process. Or the film-forming chamber with which a film-forming apparatus is equipped has a film-forming material chamber, and the exhaust mechanism is connected. The film forming material chamber is partitioned from the film forming chamber by a dividing valve, and has a film forming material holding part provided with a heating mechanism, and a mass spectrometer and an exhaust mechanism are connected. Since impurities such as moisture contained in the film forming material can be sufficiently removed in advance in the film forming material chamber, diffusion of water derived from the film forming material into the film forming chamber can be suppressed. |
| priorityDate | 2012-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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