| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33c922e05f6133b7d72dbb849d77487d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2012-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9df0bb15b5de2793fe7a1cca8cd425d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0445aa9c8fb848d9841e3b46051418d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19fc48113adfbf821a0ee0490cdabaa8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8465c85ed6bb15aa69d18280fcad4b1 |
| publicationDate |
2013-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-20130113823-A |
| titleOfInvention |
Novel polyamic acid, photosensitive resin composition, dry film and circuit board |
| abstract |
The present invention is novel polyamic acid; A photosensitive resin composition capable of providing a photosensitive material exhibiting excellent heat resistance, mechanical properties, flex resistance and electrical stability; A dry film obtained from the photosensitive resin composition; And it relates to a circuit board comprising the dry film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11618832-B2 |
| priorityDate |
2012-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |