| abstract |
The resist composition containing the high molecular compound (A1) which has a structural unit derived from the compound represented by general formula (a0-m), and the resist pattern formation method using the resist composition. [Formula 1] In formula, R < 1> is a polymeric group, Y < 1> is a C1-C30 hydrocarbon group, L < 1> is a single bond or a carbonyl group. Y 2 is a divalent linking group, R 2 is a hydrogen atom or a hydrocarbon group; Y 2 and R 2 may be bonded to each other to form a ring together with a nitrogen atom in which both Y 2 and R 2 are bonded. R 3 is a hydrogen atom or a hydrocarbon group. Y 3 is a group which forms an aromatic ring together with two carbon atoms to which Y 3 is bonded, and the aromatic ring may further have a nitro group or a substituent other than this in addition to the nitro group already bonded. |